The EBPG Plus is an ultra-high-performance electron beam lithography system. With 100 kV write mode and high-resolution lithography below 5 nm, it covers a wide range of leading-edge applications for direct-write nanolithography, industrial R&D, and batch production in every kind of nanofabrication facility. The new integrated harmonization of stability, fidelity, and precision ensures perfect interaction between all performance parameters for optimum high-resolution lithography results.