SENTECH develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research.
SENTECH is expert in structuring and deposition of thin films by means of plasma process technology, offering systems for plasma etching, PECVD and ALD.
SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry & reflectometry.
Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.
The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.
Plasma process technology
Thin Film Metrology:
The SI 500 represents the leading edge for ICP processing in research and production. Flexibility and modularity are design characteristics of the SENTECH SI 500.
A wide range of etch processes including III-V compounds (e.g. GaAs, InP, GaN, InSb.), dielectrics, quartz, glass, silicon and silicon compounds (SiC, SiGe) are
The ICPECVD plasma deposition system SI 500 D features exceptional plasma properties like high ion density, low ion energy, and low-pressure plasma deposition of dielectric films. Outstanding characteristics of the SI 500 D are the Planar Triple Spiral Antenna (PTSA) ICP source and the substrate electrode with helium backside cooling featuring dynamic temperature control for highly constant substrate temperatures.
All SENTECH plasma etching and deposition tools are able to be integrated in customized cluster configurations. The variety of SENTECH instrumentation facilitates combinations which are perfectly suited to fulfill the needs of production as well as of R&D.