SENTECH Instruments GmbH

Booth number 4C61-3

www.sentech.com

Experts in Thin Film Measurement and Plasma Process Technology.

About us

SENTECH develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research.

SENTECH is expert in structuring and deposition of thin films by means of plasma process technology, offering systems for plasma etching, PECVD and ALD.

SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry & reflectometry.

Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.

The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.

Address
SENTECH Instruments GmbH
Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 30 63925520
Internet: www.sentech.com

Contact person



Products and services

Plasma process technology 

  • ICP etch of silicon, quartz, and dielectrics, Plasma Etch using Capacitively Coupled Plasma sources, Deep RIE, ICPECVD & Thermal & Plasma Enhanced ALD, ALE

Thin Film Metrology:

  • Spectroscopic ellipsometry
  • Laser ellipsometry
  • Reflectometry
ICP-RIE plasma etcher SI 500

The SI 500 represents the leading edge for ICP processing in research and production. Flexibility and modularity are design characteristics of the SENTECH SI 500.

A wide range of etch processes including III-V compounds (e.g. GaAs, InP, GaN, InSb.), dielectrics, quartz, glass, silicon and silicon compounds (SiC, SiGe) are
available.

ICP plasma deposition system SI 500 D

The ICPECVD plasma deposition system SI 500 D features exceptional plasma properties like high ion density, low ion energy, and low-pressure plasma deposition of dielectric films. Outstanding characteristics of the SI 500 D are the Planar Triple Spiral Antenna (PTSA) ICP source and the substrate electrode with helium backside cooling featuring dynamic temperature control for highly constant substrate temperatures.

Cluster Configuration for plasma etching & deposition

All SENTECH plasma etching and deposition tools are able to be integrated in customized cluster configurations. The variety of SENTECH instrumentation facilitates combinations which are perfectly suited to fulfill the needs of production as well as of R&D.

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