Raith China Co., Ltd.

Booth number 4C61-2


Raith is a leading precision technology solution provider for nanofabrication,EBL,FIB,nanoengineering and reverse engineering applications.

About us

Raith is a leading precision technology solution provider for nanofabrication,electron beam lithography,focused ion beam fabrication,nanoengineering and reverse engineering applications.

The headquarter is in Dortmund, Germany, it works as close as possible with customers in the most important global markets through subsidiaries in the Netherlands, the USA and in Asia(Hong Kong & Beijing) and through an extensive partner and service network.

Customers include universities and other organizations involved in various fields of nanotechnology research and materials science – as well as industrial and medium sized enterprises that use nanotechnology for specific product applications or produce compound semiconductors.

Raith China Co., Ltd.
Konrad-Adenauer-Allee 8
44263 Dortmund

Phone: +49 231 950040
Internet: www.raith.com

Contact person

Raith China Co., Ltd
Room 709, Tower A, Global Trade Center, No. 36 North 3rd Ring East Road, Dongcheng District
100013 Dongcheng District
P. R. China

Phone: +86 10 59575977
Internet: www.raith.com

Products and Services

Raith’s broad nanofabrication portfolio offers the ideal solution for all your nanofabrication challenges. Whether you are seeking an electron beam nanolithography system for industrial work or academic applications, want to configure your FIB-SEM with a selection of ions for FIB nanopatterning, or already have an SEM / FIB-SEM and are looking for a way to expand its use to include nanofabrication, Raith has the optimal solution for you.
VELION-FIB and SEM for Nanofabrication

VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation.

Further reading

VOYAGER High performance Electron Beam Lithography

VOYAGER is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.
Samples of up to 8 inches are exposed at high speed. The necessary system stability is ensured, even in difficult environments, by a thermally stabilized and environmentally tolerant housing.

Further reading

EBPG Plus High-resolution lithography with automation, throughput, and reliability

The EBPG Plus is an ultra-high-performance electron beam lithography system. With 100 kV write mode and high-resolution lithography below 5 nm, it covers a wide range of leading-edge applications for direct-write nanolithography, industrial R&D, and batch production in every kind of nanofabrication facility. The new integrated harmonization of stability, fidelity, and precision ensures perfect interaction between all performance parameters for optimum high-resolution lithography results.

Further reading

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