Raith is a leading precision technology solution provider for nanofabrication,electron beam lithography,focused ion beam fabrication,nanoengineering and reverse engineering applications.
The headquarter is in Dortmund, Germany, it works as close as possible with customers in the most important global markets through subsidiaries in the Netherlands, the USA and in Asia(Hong Kong & Beijing) and through an extensive partner and service network.
Customers include universities and other organizations involved in various fields of nanotechnology research and materials science – as well as industrial and medium sized enterprises that use nanotechnology for specific product applications or produce compound semiconductors.
VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation.
VOYAGER is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.
Samples of up to 8 inches are exposed at high speed. The necessary system stability is ensured, even in difficult environments, by a thermally stabilized and environmentally tolerant housing.
The EBPG Plus is an ultra-high-performance electron beam lithography system. With 100 kV write mode and high-resolution lithography below 5 nm, it covers a wide range of leading-edge applications for direct-write nanolithography, industrial R&D, and batch production in every kind of nanofabrication facility. The new integrated harmonization of stability, fidelity, and precision ensures perfect interaction between all performance parameters for optimum high-resolution lithography results.