SENTECH Instruments GmbH

Booth number 8D25-6

www.sentech.com

SENTECH develops, manufactures, and globally sells innovative capital equipment in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research.

About us

SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology.

SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry. Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.

The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.

Address
SENTECH Instruments GmbH
Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 30 63925520
Fax: +49 30 63925522
Internet: www.sentech.com

Products and services

SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.

Thin Film Metrology:

  • Spectroscopic ellipsometry 
  • Laser ellipsometry 
  • Reflectometry 

Plasma process Technology:

  • Inductively Coupled Plasma (ICP) etch of silicon, quartz, and  
    dielectrics  
  • Plasma Etch using Capacitively Coupled Plasma (CCP) sources  
  • Deep Reactive Ion Etching (DRIE) 
  • Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (ICPECVD) 
  • Thermal and Plasma Enhanced Atomic Layer Deposition (PEALD)

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