Raith GmbH
Booth number 8D23-2Raith is a leading precision technology solution provider for nanofabrication,EBL,FIB,nanoengineering and reverse engineering applications.
About us
Raith is a leading precision technology solution provider for nanofabrication,electron beam lithography,focused ion beam fabrication,nanoengineering and reverse engineering applications.
The headquarter is in Dortmund, Germany, it works as close as possible with customers in the most important global markets through subsidiaries in the Netherlands, the USA and in Asia(Hong Kong & Beijing) and through an extensive partner and service network.
Customers include universities and other organizations involved in various fields of nanotechnology research and materials science – as well as industrial and medium sized enterprises that use nanotechnology for specific product applications or produce compound semiconductors.
Address
Raith GmbH
Konrad-Adenauer-Allee 8
44263 Dortmund
Germany
Phone: +49 231 95004-0
Internet: www.raith.com
E-mail: Send message
Room 709, Tower A, Global Trade Center, No. 36 North 3rd Ring East Road, Dongcheng District,
100013 Beijing
P. R. China
Phone: +86 10 59575977
Internet: www.raithchina.com
E-mail: Send message
Products and services
Raith’s broad nanofabrication portfolio offers the right solution for all your nanofabrication challenges. Whether you are seeking a nanolithography system to write your industrial or academic applications, want to choose from a broad selection of ions for focused ion beam lithography, or already have an SEM / FIB-SEM and are looking for a way to expand its use to nanofabrication, Raith has the optimal solution for you. Furthermore, we offer lithography systems with nanoengineering options and SEM-based solutions for large-area image acquisition. Whenever nanostructures need to be created or observed, look what Raith nanofabrication, imaging, and lithography systems can do for you to get the best out of your applications. Team up with Raith for a lifelong partnership in nanofabrication.EBPG Ultra high performance Electron Beam Lithography
High resolution lithography with automation and throughput
Shaping the future of Nanoscience
The EBPG5200 is a high performance nanolithography system with full 200 mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series. It offers a wide range of leading edge solutions for both direct write nanolithography and R&D mask making in universities and commercial centers of excellence.
VELION-FIB and SEM for Nanofabrication
FIB centric lithography architcture and laser interferometer stage supported by a tailored SEM column
VELION is a novel FIB-SEM instrument in which FIB nanofabrication has matured into the standard technique for fabricating three dimensional and high resolution nanostructures, such as plasmonic devices, nano-fluidics, localized implantation and functionalization.
VOYAGER High performance Electron Beam Lithography
VOYAGERTM is recommended for all industrial and academic Electron Beam Lithography applications where the important objectives are high write throughput and maximum resolution.
As well as the newly developed, innovative eWRITE system architecture, Raith attaches great importance to an attractive price/performance ratio throughout the lifetime of the system.
The hardware and software has been consistently designed for automated exposure operations.
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