About us

SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology.

SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry. Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.

The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.
 

Products and services

SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry. 

Thin Film Metrology: 

  • Spectroscopic ellipsometry 
  • Laser ellipsometry 
  • Reflectometry 


Plasma process Technology: 

  • Inductively Coupled Plasma (ICP) etch of silicon, quartz, and  
    dielectrics  
  • Plasma Etch using Capacitively Coupled Plasma (CCP) sources  
  • Deep Reactive Ion Etching (DRIE) 
  • Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (ICPECVD) 
  • Thermal and Plasma Enhanced Atomic Layer Deposition (PEALD) 
SENTECH SI 500

The SI 500 represents the leading edge for ICP processing in research and production. Flexibility and modularity are design cha racteristics of the SENTECH SI 500. A wide range of etch processes including III-V compounds (e.g. GaAs, InP, GaN, InSb.), dielectrics, quartz, glass, silicon and silicon compounds (SiC, SiGe) are available.

Further reading

SENTECH SILAYO

Optical coating in the nanometer-scale requires a high level of accuracy regarding layer properties such as thickness, composition, conformality and stress control. In order to ensure an excellent uniformity and conformality in layer- thickness, atomic layer deposition (ALD) is used for depositing optical thin fi lms applied as e.g. anti-refl ective coatings or optical fi lter systems. SENTECH uses the advantages of the Planar Triple Spiral Antenna (PTSA) ICP source in ICPEALD processing.

Further reading

SENTECH SENresearch 4.0

The SENresearch 4.0 covers the widest spectral range from 190 nm to 3500 nm and the highest spectral resolution in the NIR by FTIR ellipsometry.

The Step Scan Analyzer (SSA) principle is a unique feature ofthe SENresearch 4.0. The field upgradeable 2C design allowsfull Mueller matrix measurement.

The SENresearch 4.0 comes with SpectraRay/4 - SENTECH
comprehensive software for ellipsometry data acquisition and
analysis.

Further reading

Address
SENTECH Instruments GmbH
Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 30 63925520
Fax: +49 30 63925522
Internet: www.sentech.com
E-mail: Send message

Contact person

Bernd Gruska
International Sales & Marketing Manager
Phone: +49 30 63925524
E-mail: Send message

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