MENU
Logo Made in Germany CIOE 2018

SENTECH Instruments GmbH

Booth number: 1A13-6

https://www.sentech.com
info@sentech.de

About us

SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry. Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network. The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.

Products and services

SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.

Thin Film Metrology:
•Spectroscopic ellipsometry
•Laser ellipsometry
•Reflectometry

Plasma process Technology:
•Inductively Coupled Plasma (ICP) etch of silicon, quartz, and dielectrics
•Plasma Etch using Capacitively Coupled Plasma (CCP) sources
•Deep Reactive Ion Etching (DRIE)
•Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (ICPECVD)
•Thermal and Plasma Enhanced Atomic Layer Deposition (PEALD)

SENTECH SENresearch 4.0

SENTECH SENresearch 4.0

The SENresearch 4.0 covers the widest spectral range from
190 nm to 3500 nm and the highest spectral resolution in the
NIR by FTIR ellipsometry.

The Step Scan Analyzer (SSA) principle is a unique feature ofthe SENresearch 4.0. The field upgradeable 2C design allowsfull Mueller matrix measurement.

The SENresearch 4.0 comes with SpectraRay/4 – SENTECH
comprehensive software for ellipsometry data acquisition and
analysis.

www.sentech.com/en/SENresearch__219/

SENTECH SI 500

SENTECH SI 500

The SI 500 represents the leading edge for ICP processing in research and production. Flexibility and modularity are design cha racteristics of the SENTECH SI 500. A wide range of etch processes including III-V compounds (e.g. GaAs, InP, GaN, InSb.), dielectrics, quartz, glass, silicon and silicon compounds (SiC, SiGe) are available.

www.sentech.com/en/ICP-RIE-SI-500__262/

SENTECH SILAYO

SENTECH SILAYO

Optical coating in the nanometer-scale requires a high
level of accuracy regarding layer properties such as
thickness, composition, conformality and stress control.
In order to ensure an excellent uniformity and conformality
in layer-thickness, atomic layer deposition (ALD) is used for
depositing optical thin fi lms applied as e.g. anti-refl ective
coatings or optical fi lter systems. SENTECH uses the advantages of the Planar Triple Spiral Antenna (PTSA) ICP source in ICPEALD processing.

www.sentech.com/en/ALD-Systems__2492/

Contacts

Address
SENTECH Instruments GmbH
Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 30 63925520
Fax: +49 30 63925522

Bernd Gruska
International Sales & Marketing Manager
Phone: +49 30 63925524
bernd.gruska@sentech.de


Business matching
Get in contact with German companies in 3 easy steps! With one single question you can reach all relevant German Pavilion exhibitors of your selected industrial branch.

Click here if you notice an image that violates copyright or privacy rights.

Your personal organizer

Your personal organizer

Print list  |  Save as PDF
This is your personal organizer to manage your contacts to the German exhibitors.